首页> 外国专利> SOI (Silican On Insulator) by Plastic lateral transistor (Lateral Bipolar Transistor) formed on a substrate

SOI (Silican On Insulator) by Plastic lateral transistor (Lateral Bipolar Transistor) formed on a substrate

机译:通过在衬底上形成的塑料横向晶体管(横向双极晶体管)实现SOI(绝缘体上的硅)

摘要

The transistor formed in an Si layer on an insulating substrate comprises: a base region of first type formed in the Si layer emitter region of second type formed in the Si layer and sharing a junction with the base; a collector region of second type formed in the Si layer on the opposite side of the base and sharing a junction with the base; and a base electrode of first type material being insulated from the emitter and collector. The base, emitter and collector are in surface-to-surface contact with the underlying insulator of the substrate. The base region pref. has a concave vertical doping profile with a min. value at a portion between the base electrode and the insulator.
机译:在绝缘基板上的Si层中形成的晶体管包括:第一类型的基极区域,形成在Si层中的第二类型的Si层发射极区域中,并且与基极共享结;第二类型的集电极区形成在基极的相对侧上的Si层中并与基极共享结。第一类型材料的基极与发射极和集电极绝缘。基极,发射极和集电极与衬底的下面的绝缘体表面对表面接触。基础区域首选项。具有最小的凹形垂直掺杂轮廓。基极电极与绝缘体之间的部分的电阻值。

著录项

  • 公开/公告号KR850002693A

    专利类型

  • 公开/公告日1985-05-15

    原文格式PDF

  • 申请/专利权人 야마모도 다꾸마;

    申请/专利号KR19840005403

  • 发明设计人 나까노 모뚜;

    申请日1984-09-03

  • 分类号H01L29/00;

  • 国家 KR

  • 入库时间 2022-08-22 08:00:51

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