Process for deposition of metals as a thin layer on a nonmetallic substrate, with intermediate deposition of hydrides by reactive cathodic sputtering

摘要

Process for deposition of metals as a thin layer of high adherence on a nonmetallic substrate, by intermediate deposition of a layer of hydrides, characterised in that a layer of hydrides of the metals forming the target is deposited temporarily by reactive cathodic sputtering, the said target consisting of titanium or of a mixture or alloy based on titanium and on at least one other metal chosen from vanadium, chromium, manganese, iron, cobalt, nickel, copper, zirconium, niobium, molybdenum, hafnium, tantalum, tungsten, the rare earths and platinum; application especially to the production of ceramic-metal welds.