Photolithographic method producing sub-micron patterns in the manufacture of electronic microcircuits

摘要

A high-resolution photosensitive composition which can be plasma- developed, including an acrylic a polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H), for example ##STR1##