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HgCdTe MIS device having a CdTe heterojunction
HgCdTe MIS device having a CdTe heterojunction
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机译:具有CdTe异质结的HgCdTe MIS器件
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摘要
A MIS semiconductor device comprises a crystalline substrate having a first energy band gap and a crystalline passivation layer overlying a surface of the substrate. The passivation layer is comprised of a semiconductor material having a wider band gap than the semiconductor material of the substrate. In an illustrative embodiment of the invention a MIS semiconductor device comprises a mercury-cadmium- telluride (HgCdTe) substrate having a cadmium-telluride (CdTe) heterojunction formed thereon, the CdTe functioning as a layer of high- quality passivation. A metal gate insulator may be SiO.sub.2, low temperature CVD Si.sub.3 N.sub.4, or any other suitable insulator deposited at a relatively low temperature.
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机译:MIS半导体器件包括具有第一能带隙的晶体衬底和覆盖在衬底表面上的晶体钝化层。钝化层由带隙比基板的半导体材料宽的半导体材料构成。在本发明的说明性实施例中,MIS半导体器件包括在其上形成有碲化镉(CdTe)异质结的汞-碲化镉(HgCdTe)衬底,所述CdTe用作高质量钝化层。金属栅绝缘体可以是SiO 2,低温CVD Si 3 N 4或在相对较低的温度下沉积的任何其他合适的绝缘体。
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