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Method of depositing films using photo-CVD with chamber plasma cleaning
Method of depositing films using photo-CVD with chamber plasma cleaning
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机译:使用带有室等离子体清洁的光CVD沉积膜的方法
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摘要
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light source for photo CVD or a pair of electrode for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light or plasma evenly throughout the surfaces to be coated.
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