Apparatus for cleaning a chamber in a amorphous carbon-film depositing process and method of cleaning the chamber using the apparatus

摘要

amorphous carbon film deposited on the amorphous carbon film deposition process and apparatus for cleaning the inside of the reaction chamber and chamber cleaning using the same. with respect to the method disclosed. ; chamber cleaning apparatus in the amorphous carbon film deposition process according to the invention is achieved by having the gas-removable showerhead, the third gas supply module and a third gas injection module. The gas-removable showerhead includes a first gas and the second gas is supplied to the gas separation module to be supplied, the supply gas to be separated first gas and the second gas separation module and the dispersion having a plurality of holes, and the plasmanized The power is applied for the separation is that the dispersed gas into plasma is provided with a gas injection module, which is injected in common with the reaction chamber through the plurality of holes. The third gas supply unit is formed so as to surround the outer wall of the gas-removable showerhead, the third feed gas is supplied. The third gas injection module is that the third gas supply a third gas injection module is injected into the reaction chamber.