首页> 外国专利> Growth of III-V films by control of MBE growth front stoichiometry

Growth of III-V films by control of MBE growth front stoichiometry

机译:通过控制MBE生长前沿化学计量来生长III-V膜

摘要

For the growth of strain-layer materials and high quality single and multiple quantum wells, the instantaneous control of growth front stoichiometry is critical. The process of the invention adjusts the offset or phase of MBE control shutters to program the instantaneous arrival or flux rate of In and As.sub.4 reactants to grow InAs. The interrupted growth of first In, then As.sub.4, is also a key feature.
机译:对于应变层材料和高质量单量子阱和多量子阱的生长,生长前沿化学计量的瞬时控制至关重要。本发明的方法调节MBE控制百叶窗的偏移或相位,以编程In和As.4反应物的瞬时到达或通量速率以生长InAs。第一个In,然后是As.sub.4的中断生长也是一个关键特征。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号