首页> 外国专利> POLYMER SCALE DEPOSITION INHIBITOR, POLYMERIZER PROTECTED AGAINST POLYMER SCALE DEPOSITION, AND PRODUCTION OF POLYMER USING THE SAME

POLYMER SCALE DEPOSITION INHIBITOR, POLYMERIZER PROTECTED AGAINST POLYMER SCALE DEPOSITION, AND PRODUCTION OF POLYMER USING THE SAME

机译:聚合物垢沉积抑制剂,针对聚合物垢沉积的聚合物保护剂,以及使用相同的聚合物生产

摘要

PURPOSE: To effectively prevent a polymerizer from suffering polymer scale deposition not only on a polymerizer's part which is in contact with the liquid phase but also on a polymericer's part around the interface between the gas and liquid phases, and to produce a polymer product which gives a molding having extremely diminished fish eyes, a high degree of whiteness, and improved initial colorability. ;CONSTITUTION: The title inhibitor, which is used in the polymerization of an ethylenic monomer, comprises a condensate obtained by adding an aromatic hydroxy compound to a reaction system where an aromatic amine is undergoing condensation. The polymerization for producing a polymer is conducted in a polymerizer having, on its inner wall, a coating film formed from this inhibitor.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:为了有效防止聚合反应器发生聚合物垢沉积,不仅会在与液相接触的聚合反应器部分上,而且还会在气相和液相之间的界面周围的聚合反应器部分上发生沉淀,从而生产出能够鱼眼大大减少,白度高,初始着色性改善的模制品。 ;组成:用于烯类单体聚合的标题抑制剂,包括通过将芳香族羟基化合物加到芳香胺进行缩合的反应体系中而得到的缩合物。用于生产聚合物的聚合反应是在聚合器中进行的,该聚合器的内壁上有由该抑制剂形成的涂膜。版权所有:(C)1993,JPO&Japio

著录项

  • 公开/公告号JPH05178910A

    专利类型

  • 公开/公告日1993-07-20

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP19910359426

  • 发明设计人 WATANABE MIKIO;SHIMIZU TOSHIHIDE;

    申请日1991-12-27

  • 分类号C08F2/00;C09K3/00;

  • 国家 JP

  • 入库时间 2022-08-22 05:18:38

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