首页> 外国专利> POLYMER SCALE INHIBITOR AND PRODUCTION OF POLYMER IN POLYMERIZER EFFECTIVELY PROTECTED AGAINST POLYMER SCALE DEPOSITION

POLYMER SCALE INHIBITOR AND PRODUCTION OF POLYMER IN POLYMERIZER EFFECTIVELY PROTECTED AGAINST POLYMER SCALE DEPOSITION

机译:有效防止聚合物垢沉积的聚合物中的聚合物垢抑制剂和聚合物的生产

摘要

PURPOSE: To effectively prevent a polymerizer from suffering polymer scale deposition not only on the polymerizer part which is in contact with the liquid phase but also on the polymerizer part around the interface between the gas and liquid phases. ;CONSTITUTION: The title inhibitor, for use in the polymerization of an ethylenic monomer, comprises a condensate obtained by adding a terminator during the condensation of an aromatic amine conducted in the presence of at least one condensation catalyst selected from the group consisting of a halogenated oxyacid, a halogenated oxyacid salt, a peroxide, an azo compound, an oxide, chloride, and sulfate of iron or copper, and an aromatic nitro compound. A polymerizer having on its inner wall a coating film containing the condensate is used to produce a polymer.;COPYRIGHT: (C)1994,JPO&Japio
机译:用途:为了有效防止聚合器遭受聚合物垢的沉积,不仅会在与液相接触的聚合器部分上,而且还会在气相和液相之间的界面周围的聚合器部分上发生。 ;组成:用于烯键式单体聚合的标题抑制剂,包括通过在至少一种选自卤代的缩合催化剂的存在下进行的芳族胺缩合过程中添加终止剂而获得的缩合物。含氧酸,卤代含氧酸盐,过氧化物,偶氮化合物,铁或铜的氧化物,氯化物和硫酸盐,以及芳香族硝基化合物。使用在其内壁上具有包含冷凝物的涂膜的聚合器来生产聚合物。版权所有:(C)1994,JPO&Japio

著录项

  • 公开/公告号JPH06100604A

    专利类型

  • 公开/公告日1994-04-12

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP19930026248

  • 发明设计人 WATANABE MIKIO;SHIMIZU TOSHIHIDE;

    申请日1993-01-21

  • 分类号C08F2/00;

  • 国家 JP

  • 入库时间 2022-08-22 04:52:48

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