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patsuke - ji null for semiconductor integrated circuit

机译:patsuke-ji null用于半导体集成电路

摘要

PURPOSE:To enable easily the failure obstacle analysis of a semiconductor integrated circuit after cap sealing, from the outside, by arranging exposed check-pattern-measuring-terminals outside a forming region of external connection lead if a package for a semiconductor integrated circuit. CONSTITUTION:A plurality of metallized patterns 7 for check pattern are formed, on the edge portions of four sides of outer peripheral part on the mounting surface of semiconductor integrated circuit of a substrate 1a except the forming region of a metallized pattern 9 on the substrate 1a. A plurality of exposed check-pattern measuring-terminals 8 are formed in the recessed parts arranged on the outer peripheral part of the bottom part of the substrate 1a. Each of the metallized patterns 7 and each of the check pattern- measuringterminals 8 are connected via a through hole 10 so as to correspond with each other. By using the exposed check-pattern-measuringterminals 8, a check pattern formed on the semiconductor integrated circuit in which basic elements such as a transistor and a resistor and the similar ones are patternized, can be measured from the outside.
机译:目的:通过从外部将盖暴露的检查图案测量端子布置在外部连接引线(如果是用于半导体集成电路的封装)的形成区域之外,从而能够轻松地从外部对半导体集成电路进行故障障碍分析。构成:在基板1a的半导体集成电路的安装面上,在除了基板1a上的金属图案9的形成区域以外的外周部的四个边的边缘部上,形成有多个用于格子图案的金属图案7。 。在基板1a的底部的外周部上配置的凹部中形成有多个露出的检查图案测量端子8。每个金属化图案7和每个检查图案测量端子8经由通孔10连接,从而彼此对应。通过使用暴露的检查图案测量端子8,可以从外部测量形成在其中图案化诸如晶体管和电阻器等基本元件的基本元件的半导体集成电路上的检查图案。

著录项

  • 公开/公告号JPH0714022B2

    专利类型

  • 公开/公告日1995-02-15

    原文格式PDF

  • 申请/专利权人 日本電気株式会社;

    申请/专利号JP19870204702

  • 发明设计人 齋藤 睦男;

    申请日1987-08-17

  • 分类号H01L23/50;H01L23/04;

  • 国家 JP

  • 入库时间 2022-08-22 04:26:49

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