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Control of time-dependent haze in the manufacture of integrated circuits
Control of time-dependent haze in the manufacture of integrated circuits
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机译:控制集成电路制造中随时间变化的雾度
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摘要
The onset of haze on silicon wafers is controlled by treating the wafers with a chemical selected from the group consisting of hot water and isopropyl alcohol and then storing the treated wafers in an inert atmosphere such as nitrogen or argon.
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