A method for plasma - chemical deposition from the vapor phase and a method for the preparation of a film of diamond-like carbon.

摘要

A plasma CVD apparatus comprises a first vacuum enclosure 28 with a plasma generating means 29, an accelerating means 30 for accelerating ions in a plasma toward a substrate 31 and a second vacuum enclosure 27 connected to the first vacuum enclosure 28, so that the plasma gas flows into the second vacuum enclosure 27 and forms a film of uniform and superior quality at high speed.