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HGCDTE SEMICONDUCTOR DEVICE AND ITS MANUFACTURE

机译:HGCDTE半导体装置及其制造

摘要

PURPOSE: To prevent the stripping off of a passivation film having a good insulating property so as to prevent the deterioration of the electrical characteristic of an HgCdTe semiconductor device by protecting the surface of an HgCdTe substrate with a protective film and forming the passivation film near a contact hole separately from the protective film. ;CONSTITUTION: An n-type area 2 is formed by introducing an n-type impurity to part of one main surface of a p-type HgCdTe substrate 1 and a p-n junction is formed between the area 2 and substrate 1. The part which passivates the p-n junction is coated with a ZnS film 4a through an anodic sulfide film 3. In addition, the remaining part of the main surface of the substrate 1 is coated with the ZnS film 4a through the sulfide film 3. In the n-type area 2 of this photodiode, the electrode metal 8a of an ohmic-connected cathode is fitted to the n-type area 2 in the opening of the ZnS film 4a/anodic sulfide film 3 in a state where the metal 8a is surrounded by a CdTe film 12a. The CdTe film 12a also covers the surface of the ZnS film 4a/anodic sulfide film 3.;COPYRIGHT: (C)1996,JPO
机译:目的:通过用保护膜保护HgCdTe衬底的表面并在钝化膜附近形成钝化膜,以防止具有良好绝缘性能的钝化膜剥落,从而防止HgCdTe半导体器件的电特性下降。接触孔与保护膜分开。 ;构成:通过将n型杂质引入p型HgCdTe衬底1的一个主表面的一部分来形成n型区域2,并在区域2和衬底1之间形成pn结。 pn结通过阳极硫化膜3被ZnS膜4a覆盖。另外,基板1的主表面的剩余部分通过硫化膜3被ZnS膜4a覆盖。在n型区域在该光电二极管的图2中,在金属8a被CdTe膜包围的状态下,将欧姆连接的阴极的电极金属8a嵌入到ZnS膜4a /阳极硫化膜3的开口的n型区域2中。 12a。 CdTe膜12a还覆盖ZnS膜4a /阳极硫化物膜3的表面。版权所有:(C)1996,JPO

著录项

  • 公开/公告号JPH0832101A

    专利类型

  • 公开/公告日1996-02-02

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP19940162587

  • 发明设计人 NAKADA FUMIO;FUKUDA KATSUYOSHI;

    申请日1994-07-15

  • 分类号H01L31/10;H01L31/0264;

  • 国家 JP

  • 入库时间 2022-08-22 03:55:59

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