ACID DERIVATIVE COMPOUND, HIGH-MOLECULAR COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD USING THE HIGH-MOLECULAR COMPOUND

摘要

PROBLEM TO BE SOLVED: To obtain a high-quality fine pattern at a low exposure by using a high- molecular compd. having structural units derived from a (meth)acrylic acid deriv. having a specific group (e.g. a decanediyl group) as a resin for KrF excimer laser lithography. SOLUTION: A high-molecular compd. having structural units derived from a (meth) acrylic acid deriv. represented by formula I (wherein R1 is H or methyl; R2 is a 7-13C hydrocarbon group having a bridged cyclic hydrocarbon group; R3 is H or a 1-2C hydrocarbon group; R4 is a 1-2C hydrocarbon group; and R5 is a 1-12C hydrocarbon group having a 1-12C alkoxy group, etc.) or a high-moledular compd. represented by formula II (wherein R6 , R8 , and R13 are each the same as R1 ; R7 and R9 are each the same as R2 ; R10 is the same as R3 ; R11 is the same as R4 ; R12 is the same as R5 ; R14 is H or a 1-10C hydrocarbon group; x is 0.1-0.9; y is 0.1-0.7; and z is 0-0.7 provided x+y+z=1) is used together with a photoinduced acid generator for KrF excimer laser lithography. Since the sites represented by formulas III and IV of the compd. represented by formula II can be easily decomposed by an acid, these high-molecular compds. can easily give fine resolvable resist patterns at a low exposure even with a photoinduced acid generator which generates a weak acid.