High-Molecular Compounds for Photoresists, Monomeric Compounds, Photosensitive Resin Compositions, Method for Forming Patterns with the Compositions, and Process for Production of Electronic Components

摘要

Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C):