HIGH-MOLECULAR COMPOUNDS FOR PHOTORESISTS, MONOMERIC COMPOUNDS, PHOTOSENSITIVE RESIN COMPOSITIONS, METHOD FOR FORMING PATTERNS WITH THE COMPOSITIONS, AND PROCESS FOR PRODUCTION OF ELECTRONIC COMPONENTS

摘要

High-molecular compounds for photoresists, each having at least one skeleton represented by the general formula (1), (2A), (2B), or (2C): (1) (2A) (2B) (2C) wherein R is an alicyclic skeleton; and at least one of Rx1s is an electron-attracting group and the others may be the same or different from each other and are each hydrogen or a monovalent organic group.