High-Molecular Compounds for Photoresists Monomeric Compounds Photosensitive Resin Compositions Method for Forming Patterns with the Compositions and Process for Production of Electronic Components

摘要

The present invention relates to a photoresist polymeric compound containing at least one of a skeleton represented by the formula 1, 2A, 2B or 2C.; Formula 1; Formula 2A; Formula 2B; Formula 2C; In the formula, R is an aliphatic skeleton, and one at least one of R ^x1 is an electron-withdrawing group and the rest may be the same or different and hydrogen atom or a monovalent organic group.