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CARBON DENSITY MEASUREMENT OF SILICON CRYSTAL AND CARBON-FREE STANDARD SAMPLE THEREFOR

机译:硅晶体和无碳标准样品的碳密度测量

摘要

PROBLEM TO BE SOLVED: To enable measurement of even a low density of carbon with high precision, by adjusting and controlling the resistivity of a carbon-free standard sample in response to the resistivity of a silicon crystal to be measured. ;SOLUTION: In measurement of the carbon density in a silicon crystal by a Fourier transform infrared spectroscopy, the resistivity of a carbon-free standard sample is adjusted and controlled in response to the resistivity of a silicon crystal to be measured. Thus, since the carbon-free standard sample used as a reference is controlled in doping so as to have a resistivity corresponding to the resistivity of the silicon crystal to be measured, infrared absorption other than infrared absorption by carbon appearing around 600cm-1 may be offset and the base line may be horizontally stabilized. Thus, the carbon density in the silicon crystal to be measured may be measured with high precision from an infrared absorption peak to a low density.;COPYRIGHT: (C)1997,JPO
机译:解决的问题:通过响应于待测硅晶体的电阻率来调节和控制无碳标准样品的电阻率,从而能够以高精度测量甚至低密度的碳。 ;解决方案:在通过傅立叶变换红外光谱法测量硅晶体中的碳密度时,无碳标准样品的电阻率会根据要测量的硅晶体的电阻率进行调整和控制。因此,由于控制了用作参比的无碳标准样品的掺杂,使其具有与待测硅晶体的电阻率相对应的电阻率,因此除碳的红外吸收外,红外吸收出现在600cm左右。 1 可能会偏移,并且基线可能会水平稳定。因此,从红外吸收峰到低密度,可以高精度地测量要测量的硅晶体中的碳密度。版权所有:(C)1997,JPO

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