首页> 外国专利> Nitrogen density measurement manner, creation manner in the conversion table for nitrogen density measurement, production manner of the silicon wafer, and the silicon crystal of the production mannered null

Nitrogen density measurement manner, creation manner in the conversion table for nitrogen density measurement, production manner of the silicon wafer, and the silicon crystal of the production mannered null

机译:氮浓度测定方式,氮浓度测定换算表中的制作方式,硅晶片的制造方式以及该制造方式的硅晶体为空

摘要

PROBLEM TO BE SOLVED: To provide a method for evaluating a silicon crystal by accurately measuring an impurity nitrogen concentration in the silicon crystal.;SOLUTION: The method for evaluating the silicon crystal comprises the step of heating the crystal until a defect reaction in the crystal arrives at a metal-thermal equilibrium state. The method further comprises the steps of measuring the infrared absorption spectrum of the silicon crystal, and obtaining the strength of the absorption peak corresponding to the defect caused by the impurity nitrogen from the absorption spectrum.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种通过精确地测量硅晶体中的杂质氮浓度来评估硅晶体的方法。解决方案:用于评估硅晶体的方法包括加热晶体直至晶体中的缺陷反应的步骤。达到金属-热平衡状态。该方法还包括以下步骤:测量硅晶体的红外吸收光谱,并从吸收光谱中获得与杂质氮引起的缺陷相对应的吸收峰的强度。; COPYRIGHT:(C)2003,JPO

著录项

  • 公开/公告号JP3876175B2

    专利类型

  • 公开/公告日2007-01-31

    原文格式PDF

  • 申请/专利权人 富士通株式会社;

    申请/专利号JP20020074870

  • 发明设计人 棚橋 克人;金田 寛;

    申请日2002-03-18

  • 分类号H01L21/66;G01N21/35;G01N25/72;

  • 国家 JP

  • 入库时间 2022-08-21 21:07:32

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号