PULSED ION BEAM ASSISTED DEPOSITION

摘要

The present invention is a kind of film and coating material that the method for high-speed commercial scale deposits. The PIBAD (pulsed ion beam assisted deposition [Fig) processing. 4] allow electric desalting equipment to deposit, but also fill the pre-deposited processing of the particular form of film perhaps and coating, including annealing, fusing and regrowth [Fig. 4A], shock wave treatment, [Fig is redeposited for high pressure plasma. 4B], all these machinery that can change final products, bonding and etching characteristic. In one embodiment of the invention, which includes the alternating current generator (10) that motor (5) is driven. Signal is passed to pulse compression system (15) by the oscillator, with two subsystems, a 1 ν s pulse shortener (12), pulse-forming line (14). The pulse compression system (15) provides pulse to linear response voltage adder (LIVA) (20) which delivery of pulses to ion beam source (25).