PULSED ION BEAM ASSISTED DEPOSITION

摘要

The present invention is for a high-speed, commercial-scale means for deposition of films and coatings on a substrate. The PIBAD (pulsed ion beam assisted deposition) processes [Fig. 4] allow notonly deposition, but also special modes of post-deposition treatment of films and coatings, including annealing, melting and regrowth [Fig. 4A], shock wave treatment, and high-pressure plasma redeposition [Fig. 4B] all of which can alter the mechanical, cohesive, and corrosive properties of the final product. In one embodiment of the invention the power system comprises a motor (5) which drives an alternator (10). The alternator delivers a signal to a pulse compression system (15) which has two subsystems, a 1νs pulse compressor (12), and a pulse forming line (14). The pulse compression system (15) provides pulses to a linear inductive voltage adder (LIVA)(20) which delivers the pulses to the ion beam source (25).