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Doping of IIB-VIA semiconductors during molecular beam epitaxy electromagnetic radiation transducer having p-type ZnSe layer
Doping of IIB-VIA semiconductors during molecular beam epitaxy electromagnetic radiation transducer having p-type ZnSe layer
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机译:具有p型ZnSe层的分子束外延电磁辐射换能器中IIB-VIA半导体的掺杂
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摘要
An electromagnetic radiation transducer is provided having a p- type ZnSe layer and an n-type layer. The p-type ZnSe layer has a net donor to net acceptor ratio (N.sub.D /N.sub.A) of less than or equal to about 0.8. The net acceptor concentration is greater than about 5× 10.sup.15 cm .sup.-3 and the resistivity is less than 15 &OHgr;-cm. The p- type ZnSe layer is deposited by doping the ZnSe during fabrication with a neutral free-radical source.
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机译:提供具有p型ZnSe层和n型层的电磁辐射换能器。 p型ZnSe层的净给体与净受体之比(N D / NA)小于或等于约0.8。净受体浓度大于约5×10×15cm-3,电阻率小于15Ω·cm。通过在制造过程中用中性自由基源掺杂ZnSe来沉积p型ZnSe层。
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