Cleaning solution supply method of wet cleaning device for semiconductor manufacturing

摘要

The cleaning solution of the wet cleaning window for semiconductor manufacturing, which improved the method of additionally supplementing the cleaning solution to the wet cleaning device configured to overflow to the external storage tank by overflowing the cleaning solution contained in the internal storage tank where the cleaning process is performed. It relates to a supply method.;The present invention relates to a wet cleaning apparatus for manufacturing a semiconductor in which a cleaning liquid contained in an internal storage tank in which a cleaning process is performed is overflowed to an external storage tank and circulated back to the internal storage tank through a filter by a forced pump of the pump. Further, the additional supply of the cleaning liquid is characterized in that by supplying each component of the cleaning liquid to the external reservoir. Therefore, the cleaning liquid is not directly supplied to the internal storage tank containing the wafer, but is supplied to the external storage tank, so that each component of the cleaning liquid is mixed so that the cleaning liquid having a uniform concentration is supplied to the internal storage tank to prevent the wafer from being damaged. There is.