High accuracy fabrication of X-ray masks with optical and E-beam lithography

摘要

X-ray lithography is used in the fabrication of very large scale integrated circuits. Optical lithography techniques are used to create a preliminary mask with coarse features in the preparation of a high resolution x-ray mask. The E-beam tool may register the location of the E- beam relative to the optically written coarse features. This helps the tool to navigate according to the location of specific features.