Fabrication of high temperature grating on thermal barrier coatings based on solute-solvent separation soft lithography

摘要

In this study, an etched-SiO-film grating fabrication technique based on solute-solvent separation soft lithography is developed. By using this new technique, high temperature grating with frequency of 600 lines/mm is successfully fabricated on the surface of thermal barrier coatings(TBCs). During the fabrication process, the microstructure and chemical compositions of ceramic coating before and after polishing is analyzed with a digital microscope and the energy dispersive X-ray spectroscope(EDS) in scanning electron microscope(SEM). And then the grating on TBCs is heated at the temperature ranging from 300℃ to 1000℃ for examining the high temperature resistance. In the practical application, the displacement and strain field around the crack on the ceramic surface are investigated with geometry phase analysis(GPA). The successful results verify that the etched-SiO-film grating has a good oxidation resistance and can be applied to high temperature deformation measurement of TBCs.