CLEAN ROOM, MANUFACTURE OF SEMICONDUCTOR ELEMENT, TREATING CHAMBER FOR MANUFACTURING SEMICONDUCTOR ELEMENT, MANUFACTURING DEVICE FOR SEMICONDUCTOR ELEMENT AND CLEANING METHOD OF MEMBER FOR SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To restrain the generation of low molecular siloxane(LMCS), generated from a seal member by a method wherein a fluorine base seal member is employed as a seal member employed for the constituting parts of a clean room itself. SOLUTION: A gap between a HEPA filter 15 and the wall surface of a clean room 11 is sealed perfectly to isolate a clean room space 13 from a plenum chamber 17. A fluorine base seal member 18, produced by the polymer or the copolymer of vinylidene fluoride, hexafluoro propylene, tetrafluoro ethylene, perfluoro methyl vinyl ether and the like, for example, is employed for the seal member for the isolation. According to this method, LMCS, becoming contaminating gas for a semiconductor element, will not be generated and the adsorption of the LMCS to a member for semiconductor element is prevented whereby a uniform film, reduced in void, can be obtained upon forming a film, such as a gate oxidizing film, capacitor insulating film or the like.