首页> 外国专利> AN IMAGE REVERSAL TECHNIQUE FOR FORMING SMALL STRUCTURES IN INTEGRATED CIRCUITS

AN IMAGE REVERSAL TECHNIQUE FOR FORMING SMALL STRUCTURES IN INTEGRATED CIRCUITS

机译:用于在集成电路中形成小结构的图像逆向技术

摘要

The present invention provides a method for fabricating small structures to be employed in integrated circuits formed on a semiconductor substrate. Examples of such small structures include contacts, vias, and metal lines. The method of the present invention employs an image reversal technique to obtain improved feature definition. In forming a feature in a layer of material, a clear field reticle is used to form patterned segments of photoresist each having a size, a shape, and a location substantially identical to the size, the shape, and the location of one of the features intended to be formed in the layer of material. This method is employed instead of using a dark field reticle which forms windows in a photoresist each having a size, a shape, and a location substantially identical to the size, the shape, and the location of one of the features intended to be formed in the layer of material. For small structures, the openings or windows in a photoresist are harder to form than the patterned segments of photoresist. With the method of the present invention which employs a clear field reticle to form a mask comprising patterned segments of photoresist, the limitations of patterning small windows in a photoresist with the use of a dark field reticle are avoided. The accuracy of forming the small structures is thus improved.
机译:本发明提供了一种用于制造在半导体衬底上形成的集成电路中使用的小结构的方法。这种小结构的示例包括触点,通孔和金属线。本发明的方法采用图像反转技术以获得改善的特征清晰度。在材料层中形成特征时,使用透明场掩模版来形成光致抗蚀剂的图案化的片段,每个片段的尺寸,形状和位置与特征之一的尺寸,形状和位置基本相同。旨在形成在材料层中。使用该方法代替使用暗场掩模版,该掩模版在光致抗蚀剂中形成窗口,每个窗口的大小,形状和位置与要形成的特征之一的尺寸,形状和位置基本相同。材料层。对于小结构,光致抗蚀剂中的开口或窗口比光致抗蚀剂的图案化段更难以形成。利用本发明的方法,该方法采用透明场掩模版来形成包括光刻胶的图案化段的掩模,从而避免了使用暗场掩模版在光刻胶中对小窗口进行构图的限制。因此,提高了形成小结构的精度。

著录项

  • 公开/公告号EP0895656A1

    专利类型

  • 公开/公告日1999-02-10

    原文格式PDF

  • 申请/专利权人 ADVANCED MICRO DEVICES INC.;

    申请/专利号EP19970903893

  • 发明设计人 STOLMEIJER ANDRE;

    申请日1997-02-04

  • 分类号H01L21/033;H01L21/027;H01L21/768;

  • 国家 EP

  • 入库时间 2022-08-22 02:19:27

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