首页> 外国专利> Solder Bump Formation Method for Flip Chip Mounting and Semiconductor Chip with Solder Bump

Solder Bump Formation Method for Flip Chip Mounting and Semiconductor Chip with Solder Bump

机译:用于倒装芯片安装的焊料凸块形成方法以及具有焊料凸块的半导体芯片

摘要

The present invention provides a plurality of metal pads for electrically connecting an integrated circuit and an external connection means, a portion of which the metal pads are opened to expose a first passivation layer formed to cover the upper surface of the silicon substrate, and a metal pad. Preparing a silicon substrate having a second passivation film formed to have an open area and covering the upper surface of the first passivation film; Forming solder on the open region and the upper portion of the second passivation layer; And reflowing the portion where the solder is higher than the second passivation layer to have a ball shape, and a method of forming a solder bump for flip chip bonding, an integrated circuit and A plurality of metal pads formed by being electrically connected to each other, a first protective film covered on the upper surface of the silicon substrate to have an open area to which the metal pad is exposed, and formed on the upper surface of the first protective film to protect the silicon substrate from an external environment A semiconductor chip having a second protective film and a bump formed on a metal pad, wherein the solder is in an open area of the second protective film and the upper portion of the second protective film has a ball shape. to be. According to this, the height of the solder bumps is increased by the thickness of the second passivation layer to improve the reliability of the electrical connection, and even after undermounting, the flux residue can be prevented from remaining between the solder bumps and the second passivation layer. It works.
机译:本发明提供了用于电连接集成电路和外部连接装置的多个金属焊盘,该金属焊盘的一部分被打开以暴露形成以覆盖硅衬底的上表面的第一钝化层,以及金属垫。准备具有第二钝化膜的硅基板,该第二钝化膜形成为具有开口区域并覆盖第一钝化膜的上表面;在第二钝化层的开口区域和上部上形成焊料;并且使焊料比第二钝化层高的部分回流成球形,并且形成用于倒装芯片焊接的焊料凸块的方法,集成电路和通过彼此电连接而形成的多个金属焊盘。 ,第一保护膜,其覆盖在硅衬底的上表面上以具有暴露金属焊盘的开口区域,并且形成在第一保护膜的上表面上以保护硅衬底不受外部环境的影响。具有第二保护膜和形成在金属焊盘上的凸块,其中焊料在第二保护膜的开口区域中,并且第二保护膜的上部具有球形。成为。据此,通过第二钝化层的厚度增加焊料凸块的高度,以提高电连接的可靠性,并且即使在未安装之后,也可以防止焊剂残渣残留在焊料凸块和第二钝化之间。层。有用。

著录项

  • 公开/公告号KR19990074337A

    专利类型

  • 公开/公告日1999-10-05

    原文格式PDF

  • 申请/专利权人 윤종용;

    申请/专利号KR19980007871

  • 发明设计人 김남석;

    申请日1998-03-10

  • 分类号H01L23/28;

  • 国家 KR

  • 入库时间 2022-08-22 02:16:40

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