首页> 外国专利> MANUFACTURE OF FLIP CHIP MOUNTING SOLDER BUMP OF SEMICONDUCTOR DEVICE AND SOLDER BUMP MANUFACTURED BY THE SAME METHOD AND METHOD FOR ANALYZING THE SAME

MANUFACTURE OF FLIP CHIP MOUNTING SOLDER BUMP OF SEMICONDUCTOR DEVICE AND SOLDER BUMP MANUFACTURED BY THE SAME METHOD AND METHOD FOR ANALYZING THE SAME

机译:半导体器件的倒装芯片焊点的制造以及通过相同方法制造的焊点和相同方法的分析方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a flip chip mounting solder bump for a semiconductor device for using an alloy of silver and tin for the solder bump, and the solder bump manufactured by this method, and a method for analyzing this. SOLUTION: In a method for manufacturing the flip chip mounting solder bump for a semiconductor device to be mounted on a circuit board, on which a pattern has already been formed according to the characteristics of an element, a boundary film 14 is formed (1), a photo process is operated (2), silver 18 and tin 20 are plated successively on a region from which a photoresist is removed in the photo process (3), the photoresist is completely removed (4), the etching of the boundary film 14 is carried out (5), a reflow process is operated, and the silver 18 and the tin 20 successively formed by plating is mixed with a prescribed ratio so as to be turned into alloy (6).
机译:解决的问题:提供一种制造用于使用银和锡的合金作为焊料凸块的半导体器件的倒装芯片安装焊料凸块的方法,以及通过该方法制造的焊料凸块,以及用于分析该焊料凸块的方法。解决方案:在一种制造用于要安装在电路板上的半导体器件的倒装芯片安装焊料凸块的方法中,已根据元素的特性在其上形成了图案,形成了边界膜14(1)然后,进行光工艺(2),在光工艺中去除光致抗蚀剂的区域上连续镀银18和锡20(3),光致抗蚀剂被完全去除(4),对边界膜进行蚀刻进行图14所示的工序(5),进行回流处理,以规定的比例混合依次镀覆形成的银18和锡20,从而成为合金(6)。

著录项

  • 公开/公告号JPH10335364A

    专利类型

  • 公开/公告日1998-12-18

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRON CO LTD;

    申请/专利号JP19980047948

  • 发明设计人 KYO NANJU;KEN YOKAN;PARK JONG-HAN;

    申请日1998-02-27

  • 分类号H01L21/60;G01N21/88;H01L23/12;

  • 国家 JP

  • 入库时间 2022-08-22 02:31:42

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