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CRYSTAL GROWTH METHOD OF COMPOUND SEMICONDUCTOR MIXED CRYSTAL AND COMPOUND SEMICONDUCTOR DEVICE

机译:混合半导体和复合半导体器件的晶体生长方法

摘要

PROBLEM TO BE SOLVED: To obtain a compound semiconductor mixed crystal which is enhanced in crystal quality preventing the coaggulation of component elements, fluctuation in composition, and phase separation from occurring owing to nonmiscibility by a method wherein the growth of a compound semiconductor mixed crystal possessed of a nonmiscible region composition in a thermal equilibrium state is interrupted, and a compound semiconductor layer which is of the same component elements and possessed of a miscible region composition is grown. ;SOLUTION: In a process where a compound semiconductor mixed crystal 3a possessed of nonmiscible region composition in a thermal equilibrium state is grown, the growth of the compound semiconductor mixed crystal 3a is interrupted, and a compound semiconductor thin film 3b which is of the same component elements with the compound semiconductor mixed crystal 3a and possessed of a miscible region composition in a thermal equilibrium state is grown. The growth of the compound semiconductor mixed crystal 3a is interrupted, by which coaggulation of component elements, fluctuation in composition, and phase separation are prevented from occurring due to nonmiscibility. The compound semiconductor thin film 3b is inserted, by which the grown compound semiconductor mixed crystal 3a is restrained from affecting the compound semiconductor mixed crystal 3a that is successively grown.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:为了获得一种化合物半导体混合晶体,该化合物半导体混合晶体的晶体质量得到提高,该化合物半导体混合晶体通过其中具有化合物半导体混合晶体的生长的方法来防止由于不可混溶而发生组成元素的凝集,组成的波动和相分离。中断处于热平衡状态的不可混溶区域组成的混合物,并且生长具有相同组成元素并且具有可混溶区域组成的化合物半导体层。 ;解决方案:在具有处于热平衡状态的非混溶区域组成的化合物半导体混合晶体3a生长的过程中,化合物半导体混合晶体3a的生长被中断,并且具有相同结构的化合物半导体薄膜3b生长具有化合物半导体混合晶体3a并且具有处于热平衡状态的可混溶区域组成的组成元素。化合物半导体混合晶体3a的生长被中断,由此由于不可混溶而防止了组成元素的凝结,组成的波动和相分离的发生。插入化合物半导体薄膜3b,从而抑制了生长的化合物半导体混合晶体3a影响相继生长的化合物半导体混合晶体3a。版权所有:(C)2000,JPO

著录项

  • 公开/公告号JP2000216101A

    专利类型

  • 公开/公告日2000-08-04

    原文格式PDF

  • 申请/专利权人 SHARP CORP;

    申请/专利号JP19990015121

  • 发明设计人 TOMOMURA YOSHITAKA;

    申请日1999-01-25

  • 分类号H01L21/205;H01L21/203;H01L33/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:59:16

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