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MOSFET WITH RAISED STI ISOLATION SELF-ALIGNED TO THE GATE STACK

机译:自对准栅极堆叠的提高STI隔离度的MOSFET

摘要

MOSFET WITH RAISED STI ISOLATION SELF-ALIGNED TO THE GATE STACKABSTRACTA semiconductor structure comprising a transistor (39) having a gate conductor(16) that has first and second edges bounded by raised isolation structures (e.g. STI)(30). A source diffusion (38) is self-aligned to the third edge and a drain diffusion (38)is self-aligned to the fourth edge of the gate electrode.Fig. 8
机译:自对准栅极堆叠的提高STI隔离度的MOSFET抽象包括具有栅导体的晶体管(39)的半导体结构(16),其第一和第二边缘由凸起的隔离结构(例如STI)界定(30)。源极扩散区(38)与第三边缘自对准,而漏极扩散区(38)栅极自对准到栅电极的第四边缘。图8

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