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NEW MONOMER, COPOLYMER OF NEW MONOMER, PHOTORESIST COMPOSITION USING THE SAME AND METHOD FOR MANUFACTURING THE SAME
NEW MONOMER, COPOLYMER OF NEW MONOMER, PHOTORESIST COMPOSITION USING THE SAME AND METHOD FOR MANUFACTURING THE SAME
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机译:使用该单体的新单体,新单体的共聚物,光致抗蚀剂组合物及其制造方法
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摘要
PURPOSE: A new monomer, a copolymer of new monomer, a photoresist composite ion using the same, and a method for manufacturing the same are provided to supply a new monomer having a prominent adhesive strength, a copolymer of the monomer, and a photoresist composite ion using the same by using a predetermined chemical expression. CONSTITUTION: A new monomer is formed with a predetermined chemical expression. A copolymer of new monomer is formed with an another predetermined chemical expression comprising the monomer of the predetermined chemical expression. A method for manufacturing the same comprises the steps of: dissolving a compound in an organic solvent; removing the organic solvent from the resulted solution; neutralizing and extracting the resulted solution; and re-crystallizing the extracted solution in a re-crystallizing solution.
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