PROBLEM TO BE SOLVED: To obtain monomers having excellent etching durability, adhesion property and sensitivity which can be massproduced at a low production cost by using photoresist monomers expressed by a specified formula.;SOLUTION: The photoresist monomers are expressed by the formula. In the formula, each of X1 and X2 is CH2, CH2CH2, O or S, Y is CH2 or O, R1 is H or CH3, each of R' and R" is a 0-3C substd. or unsubstd. alkyl group, and i is an integer 0 to 3. The compd. expressed by the formula has three hydroxyl groups per one molecule and shows excellent adhesion property with a substrate. Since the compd. contains carboxyl groups and has excellent sensitivity, it has characteristics suitable to be used for a photoresist. Since the compd. has no odor and can be easily synthesized by recrystallization without using plural separation means such as distillation or column chromatography, the compd. can be mass-produced at a low cost.;COPYRIGHT: (C)2000,JPO
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