Method and device for measuring the thickness of a thin layer by x ray fluorescence

摘要

The invention relates to a method for measuring the thickness of thin layers by x ray fluorescence, in which is placed a sample with the layer to be analyzed in the field of observation and are then directed to the - treatment of the x-rays, it is detected with a radiation detector the fluorescent radiation emitted, and it determines the thickness of the layer. During the positioning of the sample is carried out by a focusing adjustment of a means of focusing along its optical axis and it determines the position of the focusing means near the layer located in the foyer.le device comprises a generator (2) of x-rays, a detector (17) and a device for optical observation (26) includes a focusing means (27) mounted to move along its optical axis (32) and provided with a device for measuring the position (33). this invention concerns the manufacturers of devices for measuring and analysis using fluorescence to x-rays.