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III-V arsenide-nitride semiconductor

机译:III-V砷化物-氮化物半导体

摘要

III-V arsenide-nitride semiconductor are disclosed. Group III elements are combined with group V elements, including at least nitrogen and arsenic, in concentrations chosen to lattice match commercially available crystalline substrates. Epitaxial growth of these III-V crystals results in direct bandgap materials, which can be used in applications such as light emitting diodes and lasers. Varying the concentrations of the elements in the III-V materials varies the bandgaps, such that materials emitting light spanning the visible spectra, as well as mid-IR and near- UV emitters, can be created. Conversely, such material can be used to create devices that acquire light and convert the light to electricity, for applications such as full color photodetectors and solar energy collectors. The growth of the III-V material can be accomplished by growing thin layers of elements or compounds in sequences that result in the overall lattice match and bandgap desired.
机译:公开了III-V族氮化物-氮化物半导体。 III族元素与V族元素(至少包括氮和砷)以选定的浓度组合,以匹配市场上可买到的晶体底物。这些III-V晶体的外延生长产生直接的带隙材料,该材料可用于发光二极管和激光器等应用中。改变III-V材料中元素的浓度会改变带隙,从而可以创建发射可见光谱的光以及中红外和近紫外发射器的材料。相反,这种材料可用于创建获取光并将其转换为电的设备,用于全色光电探测器和太阳能收集器。 III-V材料的生长可以通过按顺序生长元素或化合物的薄层来实现,从而导致总体上的晶格匹配和所需的带隙。

著录项

  • 公开/公告号US6100546A

    专利类型

  • 公开/公告日2000-08-08

    原文格式PDF

  • 申请/专利权人 SDL INC.;

    申请/专利号US19970908766

  • 申请日1997-08-07

  • 分类号H01L33/00;H01L31/0304;

  • 国家 US

  • 入库时间 2022-08-22 01:36:28

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