首页> 外国专利> The photosensitive film, roll condition ones which use this, manufacturing method of the photosensitive film, manufacturing method of roll condition ones, edge fusion generation prevention modulo of the photosensitive film and weaving generation prevention modulo null of the photosensitive

The photosensitive film, roll condition ones which use this, manufacturing method of the photosensitive film, manufacturing method of roll condition ones, edge fusion generation prevention modulo of the photosensitive film and weaving generation prevention modulo null of the photosensitive

机译:感光膜,使用该感光膜的辊状保护膜,感光膜的制造方法,辊状保护膜的制造方法,防止感光膜的边缘熔合产生,以及防止感光性的织造产生

摘要

PROBLEM TO BE SOLVED: To prevent slipping in a roll-type product and to prevent edge fusion by controlling the coefft. of sliding friction on the surface of a protective film not in contact with a photosensitive resin layer and by controlling the film thickness of the protective film to each specified range. ;SOLUTION: This photosensitive film consists of a supporting film, a photosensitive resin layer and a protective film. The coefft. of sliding friction (tan ) on the surface of the protective film not in contact with the photosensitive resin layer is controlled to 0.6 to 1.5, and the protective film is formed to 15 to 40 m thickness. The supporting film is preferably a polyethylene terephthalate film. As for the photosensitive resin to form the photosensitive resin layer, the resin containing a binder polymer, a photopolymn. initiator and a photopolymerizable vinyl compd. as the essential components can be used. As for the binder polymer, copolymers of alkylesters of (meth)acrylic acids or copolymers of alkylesters of (meth)acrylic acids and vinyl monomers which are copolymerizable with the esters can be used.;COPYRIGHT: (C)1998,JPO
机译:解决的问题:通过控制系数来防止卷状产品打滑并防止边缘融合。通过将保护膜的膜厚控制在每个规定的范围内,以防止在不与光敏树脂层接触的保护膜表面上的滑动摩擦。 ;解决方案:该感光膜由支撑膜,感光树脂层和保护膜组成。系数。将不与感光性树脂层接触的保护膜的表面上的滑动摩擦(tan)的Δθ控制为0.6〜1.5,并且将保护膜形成为15〜40m的厚度。支撑膜优选是聚对苯二甲酸乙二醇酯膜。形成感光性树脂层的感光性树脂为含有粘合剂聚合物,光聚合物的树脂。引发剂和可光聚合的乙烯基化合物。因为可以使用基本组件。对于粘合剂聚合物,可以使用(甲基)丙烯酸的烷基酯的共聚物或(甲基)丙烯酸的烷基酯的烷基酯与可与该酯共聚的乙烯基单体的共聚物。COPYRIGHT:(C)1998,JPO

著录项

  • 公开/公告号JP3208350B2

    专利类型

  • 公开/公告日2001-09-10

    原文格式PDF

  • 申请/专利权人 日立化成工業株式会社;

    申请/专利号JP19970138093

  • 发明设计人 櫛田 昌孝;南 好隆;

    申请日1997-05-28

  • 分类号G03F7/004;B32B7/02;B32B27/36;G03F7/09;G03F7/11;H05K3/06;

  • 国家 JP

  • 入库时间 2022-08-22 01:32:50

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