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FORMATION OF TITANIUM NITRIDE THIN FILM AND TITANIUM NITRIDE THIN FILM FORMED IN ACCORDANCE WITH THE METHOD
FORMATION OF TITANIUM NITRIDE THIN FILM AND TITANIUM NITRIDE THIN FILM FORMED IN ACCORDANCE WITH THE METHOD
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机译:用该方法形成的氮化钛薄膜和氮化钛薄膜的形成
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摘要
PROBLEM TO BE SOLVED: To provide a method for forming a titanium nitride thin film capable of forming a titanium nitride thin film having high hardness and capable of exhibiting the intrinsic physical properties characteristic of the material on the surface of a metallic material with increased adhesion in an economical vacuum and to provide a titanium nitride thin film formed in accordance with this method.;SOLUTION: This is a method for forming a titanium nitride thin film in which the surface of a metallic material is irradiated with a nitrogen beam and a titanium beam by an ion beam mixing method to form a titanium nitride thin film, and the titanium nitride thin film is formed in such a manner that the vacuum is controlled higher than 10 mTorr, the temp. of the surface of the metallic material is controlled to 20 to 1,000°C, the nitrogen beam has ≥20% ionization degree and is accelerated to 0.1 to 5 keV, and moreover, the intensity of the nitrogen beam IN satisfies IN≥ITi to the intensity of the titanium beam ITi.;COPYRIGHT: (C)2001,JPO
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