CONFIGURATION OF CHAMBER IN AUTOMATIC SINGLE WAFER WASHING APPARATUS

摘要

PROBLEM TO BE SOLVED: To improve an automatic single wafer washing apparatus for cleanly and drying wafers, eliminating splashed contaminants encountered in conventional marline. ;SOLUTION: A space is widened between a chamber and a rotating member accomodating the wafers as it comes closer to air and water outlets. Air flow and liquid flow can be directed farther outside the rotating member due to adoption of a kind of eccentric chamber. Consequently, contaminants also go farther outside the rotating member, and the wafer can be washed and dried more cleanly all over the surface.;COPYRIGHT: (C)2001,JPO