METHOD AND DEVICE FOR OPTICALLY EXAMINING STRUCTURED SURFACES OF OBJECTS

摘要

The invention relates to a method and a device for optically examining the structured surfaces of objects, notably of wafers and/or masks. Said optical device comprises an observation beam path (6) whose central axis (42) is directed perpendicularly on to the surface of the object (16), an illuminating beam (2) whose central beam (40) strikes the object (16) surface perpendicular thereto and an illuminating beam (3) whose central beam (41) strikes the object (16) surface obliquely. The image of the surface of the object (16) is observed and/or detected in the observation beam path (6). To this end a filter device (38) and/or detection device (18) is positioned in the observation beam path (6). The optical device further comprises an illuminating device (39) for simultaneously producing a bright field and a dark field illumination, a device for identifying (11) the illuminating beams (2, 3) being assigned to the bright-field (2) and/or dark-field illuminating beam (3).