Method and device for optically examining structured surfaces of objects

摘要

The present invention is an optical surface inspection method and device structure of an object (specifically, a wafer and / or a mask) is provided. One illumination light beam to the optical device center axis (42) is dropped to the surface perpendicular to the direction of the surface perpendicular to the direction of observation light path (6) of the object 16, the center beam (40) the object (16) ( 2) and, the center beam 41 is provided with the other one of the illumination light beam (3) falling on the inclined surface of the object (16). Different from the surface of the object 16 is observed or detected by the observation optical path (6). Further, in the observation optical path (6), the filter device 38 and / or the detection device 18 is disposed. Said optical device is a bright-field and dark-field includes a lighting device (39) for generating the light at the same time, name field illumination light beam (2) and / or dark-field illumination light beam 3 is provided with the illumination light beam (2, 3 ) and device 11 is attached for identification of.