首页> 外国专利> NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME AND SEMICONDUCTOR MEMORY DEVICE INCORPORATING THE NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE WITH THE VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THEREOF

NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME AND SEMICONDUCTOR MEMORY DEVICE INCORPORATING THE NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE WITH THE VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THEREOF

机译:非易失性半导体存储器装置及其制造方法非易失性半导体存储器装置及其制造方法以及制造该半导体器件的方法及其非易失性半导体存储器装置及其方法

摘要

The present invention discloses a novel structure of a nonvolatile semiconductor memory device capable of storing a plurality of bits of information. The nonvolatile semiconductor memory device according to the present invention has a charge storage layer 4 for accumulating electrons at the ends of the gate electrodes. The nonvolatile semiconductor memory device according to the present invention stores electrons in the charge storage layer 4, thereby storing a plurality of bits of information.
机译:本发明公开了一种能够存储多个信息位的非易失性半导体存储器件的新颖结构。根据本发明的非易失性半导体存储器件具有电荷存储层4,该电荷存储层4用于在栅电极的端部累积电子。根据本发明的非易失性半导体存储器件在电荷存储层4中存储电子,从而存储多个信息位。

著录项

  • 公开/公告号KR20000076792A

    专利类型

  • 公开/公告日2000-12-26

    原文格式PDF

  • 申请/专利权人 니시무로 타이죠;

    申请/专利号KR20000011598

  • 发明设计人 요시카와구니요시;

    申请日2000-03-08

  • 分类号H01L27/115;

  • 国家 KR

  • 入库时间 2022-08-22 01:14:32

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