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Semiconductor memory device having gate electrode, drain-drain contact, and drain-gate contact layers

机译:具有栅电极,漏-漏接触和漏-栅接触层的半导体存储器件

摘要

The drain of a drive transistor Q3 and the drain of a load transistor Q5 are connected by a first drain—drain contact layer. The drain of a drive transistor Q4 and the drain of a load transistor Q6 are connected by a second drain—drain contact layer. The gate electrodes of the drive transistor Q3 and the load transistor Q5 (a first gate electrode layer) are connected to the second drain—drain contact layer by a first drain-gate contact layer. The gate electrodes of the drive transistor Q4 and the load transistor Q6 (a second gate electrode layer) are connected to the first drain—drain contact layer by a second drain-gate contact layer.
机译:驱动晶体管Q 3 的漏极和负载晶体管Q 5 的漏极通过第一漏极-漏极接触层连接。驱动晶体管Q 4 的漏极和负载晶体管Q 6 的漏极通过第二漏极-漏极接触层连接。驱动晶体管Q 3 和负载晶体管Q 5 的栅电极(第一栅电极层)通过第一漏极连接到第二漏-漏极接触层。栅接触层。驱动晶体管Q 4 和负载晶体管Q 6 的栅电极(第二栅电极层)通过第二漏极连接到第一漏-漏极接触层。栅接触层。

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