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Semiconductor memory device having gate electrode, drain-drain contact, and drain-gate contact layers
Semiconductor memory device having gate electrode, drain-drain contact, and drain-gate contact layers
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机译:具有栅电极,漏-漏接触和漏-栅接触层的半导体存储器件
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摘要
The drain of a drive transistor Q3 and the drain of a load transistor Q5 are connected by a first drain—drain contact layer. The drain of a drive transistor Q4 and the drain of a load transistor Q6 are connected by a second drain—drain contact layer. The gate electrodes of the drive transistor Q3 and the load transistor Q5 (a first gate electrode layer) are connected to the second drain—drain contact layer by a first drain-gate contact layer. The gate electrodes of the drive transistor Q4 and the load transistor Q6 (a second gate electrode layer) are connected to the first drain—drain contact layer by a second drain-gate contact layer.
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