WAFER TRAY USED FOR RAPID THERMAL PROCESSING APPARATUS

摘要

PURPOSE: A wafer tray of rapid thermal processing equipment is provided to make a wafer have a uniform distribution of resistivity through an annealing process, by stably fixing the wafer to be aligned with a hot liner and by uniformly maintaining the interval with the hot liner regarding the entire surface of the wafer. CONSTITUTION: The wafer tray is used in the rapid thermal processing equipment. A penetration hole is formed inside a frame(2). At least three sheets(8) are formed, extending from the frame to the inside of the penetration hole. The hot liner(6) is supported by the sheets.