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Thin film measurement is possible the semiconductor substrate thin film generation device and the vertical model boat

机译:可以进行薄膜测量的半导体基板薄膜生成装置和垂直模型舟

摘要

PROBLEM TO BE SOLVED: To prevent the useless consumption of wafers for measuring film thickness by arranging a substrate-like film thickness measuring jig on a semiconductor wafer mounting position and, at the same time, forming the measuring jig in the same shape as that of a wafer and a chip mounting section on the chip mounting section of which a film thickness measuring chip is disposed. ;SOLUTION: Four holding bars 13d are uprightly arranged between a top plate 13b and a bottom plate 13c and a film thickness measuring jig 11 is detachably attached to appropriate positions of the holding grooves 13a of the bars 13d. Then chips 12 for measuring film thickness 12 are housed in the upper surface of the jig 11 and square grooves which are chip mounting sections having nearly the same shape as that of the chips 12 are formed so as to retain the chips 12 in forming a film on the surface of a wafer. Therefore, since the chips 12 are arranged only at the location where the thickness of a deposited film is measured, the amount of silicon wafers used for film thickness measurement can be minimized.;COPYRIGHT: (C)1998,JPO
机译:解决的问题:通过在半导体晶片的安装位置上布置基板状的膜厚测量夹具,同时将测量夹具形成为与晶片的形状相同的形状,来防止用于测量膜厚的晶片的无用消耗。晶片和晶片安装部,在该晶片安装部上设置有膜厚计测芯片。解决方案:在顶板13b和底板13c之间直立地布置四个保持杆13d,并且将膜厚测量夹具11可拆卸地附接到该保持杆13d的保持槽13a的适当位置。然后,将用于测量膜厚12的芯片12容纳在夹具11的上表面中,并且形成方形凹槽,该方形凹槽是具有与芯片12的形状几乎相同的形状的芯片安装部,从而在形成膜时保持芯片12。在晶圆表面上。因此,由于仅将芯片12布置在测量沉积膜的厚度的位置,所以可以最小化用于膜厚度测量的硅晶片的数量。版权所有:(C)1998,JPO

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