Substrate cleaning manner and is used for that the rotating type substrate cleaning device

摘要

PURPOSE: To increase cleaning treatment efficiency by rapidly returning a cleaning tool from the peripheral edge part to the center part of rotation on a substrate. ;CONSTITUTION: In the case of moving a cleaning tool 12 from the stand-by position apart from the upper part of a substrate W to the cleaning position of the center part of rotation of the substrate W and in the case of returning the cleaning tool 12 from the cleaning position of the peripheral edge part of the substrate W to the stand-by position, the cleaning tool 12 is fully raised and lowered so as to exceed a cup 5. In a cleaning process, in the case of returning the cleaning tool 12 from the outer peripheral edge part of the substrate W to the central part of rotation of the substrate, the cleaning tool 12 is raised to such a position as it is not acted on the substrate W. The cleaning tool 12 is raised and lowered at a small stroke of this position and the position acting on the substrate W.;COPYRIGHT: (C)1996,JPO