ULTRA-FINE PARTICLE FILM MANUFACTURING DEVICE, AND ULTRA- FINE PARTICLE FILM FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To prevent an ultra-fine particle film from being trailed, a carrier gas from riding on a flow diffusing around a substrate after being collided with the substrate, and ultra-fine particles from being scattered to other parts than the film.;SOLUTION: In a gas deposition method in which ultra-fine particles generated in an ultra-fine particle generation chamber are led into a film forming chamber through a transport pipe together with the carrier gas and injected for film deposition onto the substrate 10 placed on a stage in the film forming chamber through a nozzle 4 disposed in a perpendicular attitude, a gas injection nozzle 14 to inject the gas is provided on both sides of the vicinity of the nozzle 4 to inject the ultra-fine particles into the film forming chamber. The flow 19 of the carrier gas containing the ultra-fine particles in which the advancing direction is changed from the flows 11 and 12 by the flow 18 of the gas injected from the gas injection nozzle 14 is collided against the substrate 10 to form a plotting line 17 of the ultra-fine particle film on the substrate 10.;COPYRIGHT: (C)2003,JPO