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amp;beta;-FeSi2 AND METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT CONTAINING amp;beta;-FeSi2

机译:β-FeSi2及其制造方法,以及包含β-FeSi2的半导体集成电路

摘要

PROBLEM TO BE SOLVED: To provide high quality β-FeSi2 having high crystal property which is formed on any surface part of an Si substrate without needing of a large-scale apparatus, and a semiconductor integrated circuit containing β-FeSi2.;SOLUTION: The Raman strength of β-FeSi2 which is measured at room temperature by Ar ion laser of 514.5 nm wave length as a light source for excitation, is 30% or more than that of Si as a substrate of β-FeSi2.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供不需要大型装置就可以在Si衬底的任何表面部分上形成的具有高晶体性质的高质量β-FeSi 2 和半导体集成电路解决方案:β-FeSi 2 的拉曼强度是在室温下通过514.5 nm波长的Ar离子激光在室温下测得的。用于激发的光源比作为β-FeSi 2 衬底的Si的激发光源要高30%或更多。

著录项

  • 公开/公告号JP2003002630A

    专利类型

  • 公开/公告日2003-01-08

    原文格式PDF

  • 申请/专利权人 NEW INDUSTRY RESEARCH ORGANIZATION;

    申请/专利号JP20010189001

  • 发明设计人 KITA TAKASHI;

    申请日2001-06-22

  • 分类号C01B33/06;

  • 国家 JP

  • 入库时间 2022-08-22 00:12:49

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