首页>
外国专利>
amp;beta;-FeSi2 AND METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT CONTAINING amp;beta;-FeSi2
amp;beta;-FeSi2 AND METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT CONTAINING amp;beta;-FeSi2
展开▼
机译:β-FeSi2及其制造方法,以及包含β-FeSi2的半导体集成电路
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide high quality β-FeSi2 having high crystal property which is formed on any surface part of an Si substrate without needing of a large-scale apparatus, and a semiconductor integrated circuit containing β-FeSi2.;SOLUTION: The Raman strength of β-FeSi2 which is measured at room temperature by Ar ion laser of 514.5 nm wave length as a light source for excitation, is 30% or more than that of Si as a substrate of β-FeSi2.;COPYRIGHT: (C)2003,JPO
展开▼