OPTICAL DEVICE SUBSTRATE HAVING amp;beta;-FeSi2 LAYER ON ITS SURFACE, AND TO PROVIDE MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide an optimal method for manufacturing an optical device substrate having a β-FeSi₂ layer on its surface by introducing Fe atoms on an SOI substrate using the ion implantation method.;SOLUTION: The method for manufacturing the optical device substrate having a β-FeSi₂ layer on its surface includes implanting iron ions into a surface Si layer of an SOI substrate, and then applying a heat treatment to form a β-FeSi₂ layer on the surface. The amount that the iron ions are implanted into the surface Si layer of the SOI substrate meets a composition ratio of about 1:2 for the ratio of Fe to Si in the surface layer, and preferably the heat treatment temperature is not less than 900°C and is less than 1100°C and the time of the treatment is not less than one minute and is less than ten minutes.;COPYRIGHT: (C)2009,JPO&INPIT