A MULTI-STAGE ARSENIC DOPING PROCESS TO ACHIEVE LOW RESISTIVITY IN SILICON CRYSTAL GROWN BY CZOCHRALSKI METHOD

摘要

Title: A MULTI-STAGE ARSENIC DOPING PROCESS TO ACHIEVE LOW RESISTIVITY IN SILICON CRYSTAL GROWN BY CZOCHRALSKI METHOD[err]Abstract: A method of lowering the resistivity of resultant siliconcrystal from a Czochralski crystal growing process by addingarsenic dopant to the melt in multiple stages.