METHOD OF OPTICLAL LITHOGRAPHY USING PHASE SHIFT MASKING

摘要

The method of performing polylevel lithography to fabricate integrated circuits uses phase shift masks in staged and repetitive optical tools. Here, the phase assignment required for the phase shift mask is determined by the technique of determining the intersection of the active gate pattern and the gate pattern without division, and dividing the intersection into a category of stacking. Slightly different phase assignment laws are used on different stacks.